Russia presents a plan for developing EUV lithographic machines by 2037

Zdjęcie: Rosja przedstawia plan rozwoju maszyn litograficznych EUV do 2037 roku


Russia has revealed a fresh roadmap for the improvement of 11.2 nm EUV lithography technology to cover the period up to 2037. The task assumes 3 stages of improvement – from the construction of a device capable of working in lithography 40 nm in 2026 to sub-10 nm systems from 2033 to 2036. The Institute of Microstructure Physics of the Russian Academy of Sciences is liable for drafting the plan, and the concept itself differs importantly from the solutions utilized by ASML. The Russians do not want to copy existing architecture, but trust on alternate [...]